@Stickman393 -
So did you re-measure them after your vacuum treatment?
Did any change?
Experimental data always wins!
If nothing changed much, I suspect they are still hermetically sealed.
When something is chemi-sorbed you generally need high vacuum** + heat to get any out (for that exp(-ΔE/kT)*** factor), and typically you will have important temperature constraints that limit how much can be removed. E.g., too much heat for too long will definitely damage those Ge transistors. There may be solder on the leads inside the can, dopant atoms in the germanium can diffuse (move) and damage the device, the case itself may have temp limits, etc, etc. I doubt it's worth trying. But if you do I'd be really careful, look at some spec sheets for those or similar transistors and stay well below any listed max heat values, especially since you might warm it for an hour or so under vacuum. If you want to experiment, just try it w/ one transistor, starting with the worst leaker. Measure before and after.
Sorry, I'm just a nerd...

But I admire your experimental curiousity!
**
@Stickman393 asked about the requisite vacuum, which is a very good question - and unfortunately hard to quantify. You try to think about what types of background gas atoms you're exposing it to, and what damage they might cause. The usual lab approach is to make the vacuum so damn good that even if every background gas atom stuck, the resulting impurity level would be too low to matter. That usually leads to ultrahigh vaccum. In my prior science days, we made thin films samples at ultra-high vacuum for physical study. Our system had a base pressure of <1x10^-10 torr, or roughly 10^-7 micron.
*** k = Boltzmann's constant, T= temperature (°Kelvin)